ION IMPLANTATION
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Q-One Advanced Platform for Nanoscale Ion Implantation

Q-OneTM is a state-of-the-art tool for deterministic single ion implantation with nanoscale precision. A completely new design, this powerful FIB enables positioning of single ions with incredible accuracy and unprecedented speed. Featuring a host of powerful features, the Q-OneTM is the most advanced system for fabrication of quantum devices and advanced materials engineering.
Key Features
- Deterministic single ion implantation
- 25 kV liquid metal ion source
- 20 nm ion column
- Implant a wide range of elements
- Nanometre-precision stage
- High-resolution electron column
- 6-inch wafer handling with load-lock